CVD & PECVD

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

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1200°C PE/CVD Furnace 1400°C CVD Tube Furnace with Gas Mixing 1700°C CVD Tube Furnace with Gas Mixing & Pumping System
1200°C PE/CVD Furnace w/ RF Generator, Gas Mix & Pumping System1400°C CVD Tube Furnace with Gas Mixing & Pumping System1700°C CVD Tube Furnace with Gas Mixing & Pumping System

40-segment digital controller, overheat / power failure protection, PC interface kit, quartz tubes, vacuum sealing flanges incl.

40-segment digital controller, overheat / power failure protection, PC interface kit, vacuum sealing flanges, crucibles incl.

40-segment digital controller, overheat / power failure protection, PC interface kit, vacuum sealing flanges, crucibles incl.

$4,990.00

This item ships freight.

$5,990.00

This item ships freight.

$7,690.00

This item ships freight.

Ai 500 Watts 13MHz RF Generator for Up To 150mm Tube Furnaces
Ai 500 Watts 13MHz RF Generator for Up To 150mm Tube Furnaces

Recommended for our CVD tube furnaces

$12,000.00