CVD & PECVD

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

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1200°C PE/CVD Furnace w/ RF Generator, Gas Mix & Pumping System 1400°C CVD Tube Furnace with Gas Mixing & Pumping System 1700°C CVD Tube Furnace with Gas Mixing & Pumping System
1200°C PE/CVD Furnace w/ RF Generator, Gas Mix & Pumping System1400°C CVD Tube Furnace with Gas Mixing & Pumping System1700°C CVD Tube Furnace with Gas Mixing & Pumping System

40-segment digital controller, overheat / power failure protection, PC interface kit, quartz tubes, vacuum sealing flanges incl.

40-segment digital controller, overheat / power failure protection, PC interface kit, vacuum sealing flanges, crucibles incl.

40-segment digital controller, overheat / power failure protection, PC interface kit, vacuum sealing flanges, crucibles incl.

$4,990.00

This item ships freight.

$5,990.00

This item ships freight.

$7,690.00

This item ships freight.